The SU9000 is HITACHI's new premium UHR FE-SEM. It features unique electron optics, with the sample positioned inside a gap of the split objective lens pole piece. This so-called true inlens concept - combined with the next generation of HITACHI's cold field emission technology - guarantees the highest possible system resolution (0.4nm @ 30kV, 1.2nm @ 1kV) and stability.
To make this resolving power usable in practical work in your lab, the SU9000 utilizes an ultra-stable side-entry sample stage similar to high-end TEM systems and incorporates optimized vibration damping and a closed cabinet to shield the electron optics from environmental noise. Furthermore, the clean vacuum concept of SU9000 offers a one order of magnitude better vacuum level in gun and sample chamber than the previous generation, minimizing sample contamination artefacts (effective pre-observation cleaning of samples itself can be achieved by Hitachi's ZoneSEM sample cleaner).
Besides pure unsurpassed resolution, the SU9000 is equipped with a remarkable 2+2 detection system for sample surface, composition and transmission observations.
While the patented Super ExB filter in combination with the first upper detector allows to filter and collect the SE and LA-BSE signal energies of interest, thereby suppressing charging artefacts and showing topographical details, the top detector selectively receives HA-BSE signal, providing topography-free information of material and crystallographical orientation differences. This signal selection technology makes the SU9000 also a prefered system for e.g. catalyst research and - in combination with a crygenic sample holder - biological and pharmaceutical immunolabeling applications.
The SU9000 is also a most powerful STEM, showing often higher contrast on critical sample features than high-energy S-TEM systems. Brightfield and annular Darkfield imaging is possible simultaneously, with the darkfield detector settable to 56 different positions for an optimized selection of Z-contrast of the pattern of interest.
